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Congratulations to Associate Professor Ray Adomaitis (ChE/ISR), Professor and former ISR Director Gary W. Rubloff (MSE/ISR), and former ISR-affiliated faculty member John Kidder. On Nov. 23 they received U.S. Patent 6,821,910 for "Spatially programmable microelectronics process equipment using segmented gas injection showerhead with exhaust gas recirculation."
This is a multizone, segmented showerhead for use in chemical vapor deposition, in plasma deposition and etching and other processes. It provides a gas impingement flux distribution controllable in two lateral dimensions to achieve programmable uniformity in recirculation (pumping) of exhaust gases back through the showerhead. It reduces intersegment mixing to achieve a high degree of spatial control of the process. The showerhead is useful for process tuning and optimization in manufacturing or for rapid materials and process discovery and optimization in research and development. | ISR patents page |
—December 2004
December 7, 2004
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